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USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A

669.950 / AP69U
Apruzese,J P, Whitney,K G
USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A / .- National Social Science Documentation Centre,New, 1978 .- iii, . .- ( Nrl Memorandum Report
Reprinted By Ntis
Subject Headings:
Metallography;
X-Rays --Industrial Applications;
Author Added Entry:
Davis,J;
Copy Details:
Acc. No.: A64055, Full Call No.: 669.950 AP69U, Item type: Books , Location: COMPACT STORAGE (BASEMENT),
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USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A