Reactive sputter deposition (Record no. 361195)
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000 -LEADER | |
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fixed length control field | 00489pam a2200169a 44500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 160408b2008 xxu||||| |||| 00| 0 eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
International Standard Book Number | 9783540766629 |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 621.38152 |
Item number | R22 |
100 ## - MAIN ENTRY--PERSONAL NAME | |
Personal name | |
245 1# - TITLE STATEMENT | |
Title | Reactive sputter deposition |
Statement of responsibility, etc. | edited by D. Depla |
260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
Place of publication, distribution, etc. | Berlin |
Name of publisher, distributor, etc. | Springer |
Date of publication, distribution, etc. | 2008 |
300 ## - PHYSICAL DESCRIPTION | |
Extent | xviii, 570p. |
440 ## - SERIES STATEMENT/ADDED ENTRY--TITLE | |
Title | Springer Series In Materials Science |
Volume/sequential designation | |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical term or geographic name entry element | Cathode Sputtering (Plating Process) |
700 ## - ADDED ENTRY--PERSONAL NAME | |
Personal name | Mahieu, S.,Ed. |
997 ## - | |
-- | A161826 s C |
Withdrawn status | Lost status | Damaged status | Not for loan | Collection code | Home library | Current library | Date acquired | Cost, normal purchase price | Total Checkouts | Full call number | Barcode | Date last seen | Uniform Resource Identifier | Price effective from | Koha item type |
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COMPACT STORAGE (BASEMENT) | PK Kelkar Library, IIT Kanpur | PK Kelkar Library, IIT Kanpur | 08/04/2008 | 9607.56 | 621.38152 R22 | A161826 | 08/04/2016 | Book Request | 08/04/2016 | Books |