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Chemical process design and simulation (Record no. 560907)

MARC details
000 -LEADER
fixed length control field 02318 a2200181 4500
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9781119089117
040 ## - CATALOGING SOURCE
Transcribing agency IIT Kanpur
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 660.2812
Item number H324c
100 ## - MAIN ENTRY--AUTHOR NAME
Personal name Haydary, Juma
245 ## - TITLE STATEMENT
Title Chemical process design and simulation
Remainder of title Aspen Plus and Aspen HYSYS applications
Statement of responsibility, etc Juma Haydary
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication New Jersey
Name of publisher John Wiley
Year of publication 2019
300 ## - PHYSICAL DESCRIPTION
Number of Pages xliv, 391p
520 ## - SUMMARY, ETC.
Summary, etc Chemical Process Design and Simulation is an accessible guide that offers information on the most important principles of chemical engineering design and includes illustrative examples of their application that uses simulation software. A comprehensive and practical resource, the text uses both Aspen Plus and Aspen Hysys simulation software.<br/><br/>The author describes the basic methodologies for computer aided design and offers a description of the basic steps of process simulation in Aspen Plus and Aspen Hysys. The text reviews the design and simulation of individual simple unit operations that includes a mathematical model of each unit operation such as reactors, separators, and heat exchangers. The author also explores the design of new plants and simulation of existing plants where conventional chemicals and material mixtures with measurable compositions are used. In addition, to aid in comprehension, solutions to examples of real problems are included. The final section covers plant design and simulation of processes using nonconventional components. This important resource:<br/><br/> Includes information on the application of both the Aspen Plus and Aspen Hysys software that enables a comparison of the two software systems<br/> Combines the basic theoretical principles of chemical process and design with real-world examples<br/> Covers both processes with conventional organic chemicals and processes with more complex materials such as solids, oil blends, polymers and electrolytes<br/> Presents examples that are solved using a new version of Aspen software, ASPEN One 9<br/><br/>Written for students and academics in the field of process design, Chemical Process Design and Simulation is a practical and accessible guide to the chemical process design and simulation using proven software.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Chemical processes
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Chemical engineering -- Computer simulation
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Books
Holdings
Withdrawn status Lost status Damaged status Not for loan Collection code Home library Current library Date acquired Source of acquisition Cost, normal purchase price Full call number Accession Number Cost, replacement price Koha item type
        General Stacks PK Kelkar Library, IIT Kanpur PK Kelkar Library, IIT Kanpur 18/11/2019 60 7941.00 660.2812 H324c A184965 9926.65 Books

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