Image from Amazon.com
SCIENTIFIC WET PROCESS TECHNOLOGY FOR INNOVATIVE LSI/FPD MANUFACTURING
Material type:
TextPublication details: Crc Press, Boca Raton 2006Description: xiii,386ISBN: - 0849335434
- 621.38152 SC27O
| Item type | Current library | Collection | Call number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|---|
Books
|
PK Kelkar Library, IIT Kanpur | General Stacks | 621.38152 SC27O (Browse shelf(Opens below)) | Available | A155221 |
Total holds: 0
Browsing PK Kelkar Library, IIT Kanpur shelves, Collection: General Stacks Close shelf browser (Hides shelf browser)
| No cover image available |
|
|
|
|
|
No cover image available | ||
| 621.38152 R279 RALIABILITY AND DEGRADATION | 621.38152 R591m The materials science of semiconductors | 621.38152 R932N NITRIDE SEMICONDUCTORS | 621.38152 SC27O SCIENTIFIC WET PROCESS TECHNOLOGY FOR INNOVATIVE LSI/FPD MANUFACTURING | 621.38152 Sch22c Chalcogenide photovoltaics | 621.38152 SE39C CMOS ELECTRONICS | 621.38152 Se48a ANALYSIS AND SIMULATION OF SEMICONDUCTOR DEVICES |
There are no comments on this title.
Log in to your account to post a comment.