Image from Amazon.com
Fabrication and characterization in the micro-nano range : new trends for two and three dimensional structures
Material type:
TextSeries: Advanced Structured Materials / Edited By Andreas Ochsner ; V.10Publication details: Berlin Springer 2011Description: x, 222pISBN: - 9783642177811
- 621.3815 F114
| Item type | Current library | Collection | Call number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|---|
Books
|
PK Kelkar Library, IIT Kanpur | General Stacks | 621.3815 F114 (Browse shelf(Opens below)) | Available | A172164 |
Total holds: 0
Browsing PK Kelkar Library, IIT Kanpur shelves, Collection: General Stacks Close shelf browser (Hides shelf browser)
|
|
|
|
|
No cover image available |
|
||
| 621.3815 EL257 EDA FOR IC IMPLEMENTATION, CIRCUIT DESIGN, AND PROCESS TECHNOLOGY | 621.3815 EL87S SILICON MICROMACHINING | 621.3815 En97c Charge-based MOS transistor modeling | 621.3815 F114 Fabrication and characterization in the micro-nano range | 621.3815 F453P FIELD-PROGRAMMABLE ANALOG ARRYS | 621.3815 F556t TRANSISTOR CIRCUIT ANALYSIS AND DESIGN | 621.3815 F582a Analog design and simulation using OrCAD capture and PSpice |
There are no comments on this title.
Log in to your account to post a comment.