Chemical vapour deposition : precursors, processes and applications
Material type:
- 9780854044658
- 671.735 C42
Item type | Current library | Collection | Call number | Status | Date due | Barcode | Item holds | |
---|---|---|---|---|---|---|---|---|
![]() |
PK Kelkar Library, IIT Kanpur | General Stacks | 671.735 C42 (Browse shelf(Opens below)) | Available | A180562 |
Total holds: 0
Browsing PK Kelkar Library, IIT Kanpur shelves, Collection: General Stacks Close shelf browser (Hides shelf browser)
![]() |
![]() |
![]() |
![]() |
![]() |
![]() |
No cover image available | ||
671.734 SO12H HIGH VELOCITY OXY-FUEL SPRAYING | 671.734 T343 THERMAL SPRAYING FOR POWER GENERATION COMPONENTS | 671.735 C355v CHEMICAL VAPOR DEPOSITION | 671.735 C42 Chemical vapour deposition | 671.735 M436h2 Handbook of physical vapor deposition (PVD) processing | 671.735 M829t THIN FILM BY CHEMICAL VAPOUR DEPOSITION | 671.735 P871v VAPOR DEPOSITION |
There are no comments on this title.
Log in to your account to post a comment.