Process variations in microsystems manufacturing
Language: English Series: Microsystems and Nanosystems | / edited by Roger T. HowePublication details: Springer 2020 SwitzerlandDescription: xix, 521pISBN:- 9783030405588
- 621.381 H872p
Item type | Current library | Collection | Call number | Status | Date due | Barcode | Item holds | |
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PK Kelkar Library, IIT Kanpur | General Stacks | 621.381 H872p (Browse shelf(Opens below)) | Available | A185439 |
This book thoroughly examines and explains the basic processing steps used in MEMS fabrication (both integrated circuit and specialized micro machining processing steps. The book places an emphasis on the process variations in the device dimensions resulting from these commonly used processing steps. This will be followed by coverage of commonly used metrology methods, process integration and variations in material properties, device parameter variations, quality assurance and control methods, and design methods for handling process variations. A detailed analysis of future methods for improved microsystems manufacturing is also included. This book is a valuable resource for practitioners, researchers and engineers working in the field as well as students at either the undergraduate or graduate level.
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