| 000 | 00622pam a2200193a 44500 | ||
|---|---|---|---|
| 008 | 160408b1978 xxu||||| |||| 00| 0 eng d | ||
| 082 |
_a669.950 _bAP69U |
||
| 100 | _aApruzese,J P, Whitney,K G | ||
| 245 | 1 | _aUSE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A | |
| 260 |
_a _bNational Social Science Documentation Centre,New _c1978 |
||
| 300 | _aiii, | ||
| 440 |
_aNrl Memorandum Report _v |
||
| 500 | _aReprinted By Ntis | ||
| 650 | _aMetallography | ||
| 650 | _aX-Rays --Industrial Applications | ||
| 700 | _aDavis,J | ||
| 964 | _gCIRC | ||
| 997 | _aA64055 C | ||
| 999 |
_c309720 _d309720 |
||