| 000 | 00587pam a2200193a 44500 | ||
|---|---|---|---|
| 008 | 160408bc1998 xxu||||| |||| 00| 0 eng d | ||
| 020 | _a019856287X | ||
| 082 |
_a621.381531 _bSU31P |
||
| 100 | _aSugawara,M. | ||
| 245 | 1 |
_aPLASMA ETCHING _cFUNDAMENTALS AND APPLICATIONS |
|
| 260 |
_a _bOxford Univ. Pr., Oxford _cc1998 |
||
| 300 | _aviii,347 | ||
| 440 |
_aSeries On Semiconductor Science And Technology _v |
||
| 500 | _aIncludes Bibliographical References And Index | ||
| 650 | _aSemiconductors -- Etching | ||
| 650 | _aPlasma Etching | ||
| 964 | _gCIRC | ||
| 997 | _aA126191 C | ||
| 999 |
_c331459 _d331459 |
||