| 000 | 00612pam a2200205a 44500 | ||
|---|---|---|---|
| 008 | 160408bc1999 xxu||||| |||| 00| 0 eng d | ||
| 020 | _a012533026X | ||
| 082 |
_a621.38152 _bP871P |
||
| 100 | _aPowell,Ronald A | ||
| 245 | 1 |
_aPVD FOR MICROELECTRONICS _cSPUTTER DEPOSITION APPLIED TO SEMICONDUCTOR MANUFACTURING |
|
| 260 |
_a _bAcademic Press, San Diego _cc1999 |
||
| 300 | _axiii,419 | ||
| 440 |
_aThin Films _v |
||
| 650 | _aThin Film Devices -- Design And Construction | ||
| 650 | _aVapor-Plating | ||
| 650 | _aThin Films | ||
| 700 | _aRossnagel,Stephen M | ||
| 964 | _gCIRC | ||
| 997 | _aA131810 C | ||
| 999 |
_c334299 _d334299 |
||