000 | 00489pam a2200169a 44500 | ||
---|---|---|---|
008 | 160408b2008 xxu||||| |||| 00| 0 eng d | ||
020 | _a9783540766629 | ||
082 |
_a621.38152 _bR22 |
||
100 | _a | ||
245 | 1 |
_aReactive sputter deposition _cedited by D. Depla |
|
260 |
_aBerlin _bSpringer _c2008 |
||
300 | _axviii, 570p. | ||
440 |
_aSpringer Series In Materials Science _v |
||
650 | _aCathode Sputtering (Plating Process) | ||
700 | _aMahieu, S.,Ed. | ||
997 | _aA161826 s C | ||
999 |
_c361195 _d361195 |