000			01597 a2200229 4500
020			_a9780081021392
040			_cIIT Kanpur
041			_aeng
082			_a537.6 _bC738
245			_aCMOS past, present and future _cHenry H. Radamson ...[et al.]
260			_bWoodhead Publishing _c2018 _aDuxford
300			_avii, 263p
440			_aWoodhead publishing series in electronic and optical materials
520			_aCMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements.
650			_aSemiconductors
650			_aMetal oxide semiconductors, Complementary
700			_aRadamson, Henry H.
700			_aLuo, Jun
700			_aSimoen, Eddy
700			_aZhao, Chao
942			_cBK
999			_c559418 _d559418