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USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A

By:

Apruzese,J P, Whitney,K G

Contributor(s):

Davis,J

Material type: Text

Text

TextSeries: Nrl Memorandum Report ; Publication details: National Social Science Documentation Centre,New 1978Description: iiiSubject(s):

DDC classification:

669.950 AP69U

Average rating: 0.0 (0 votes)

Holdings
Item type	Current library	Collection	Call number	URL	Status	Date due	Barcode	Item holds
Books	PK Kelkar Library, IIT Kanpur	COMPACT STORAGE (BASEMENT)	669.950 AP69U (Browse shelf(Opens below))	Link to resource	Damaged (F)		A64055

Total holds: 0

Browsing PK Kelkar Library, IIT Kanpur shelves, Collection: COMPACT STORAGE (BASEMENT) Close shelf browser (Hides shelf browser)

Previous	No cover image available	No cover image available	No cover image available	No cover image available	No cover image available	No cover image available	No cover image available	Next
Previous	669.94028 C76 COMPUTATIONAL TECHNIQUES ON AN AID IN PHYSICAL METALLURGY	669.95 Al57 ALLOY DESIGN	669.95 Ap58 APPLIED METALLOGRAPHY	669.950 AP69U USE OF MULTIPLE PHOTOEXCITATION IN AN OPTICALLY THICK SILICON-ALUMINUM PLASMA TO OBTAIN LASING AT 44 A	669.95 B455m MAGNETISM AND METALLURGY	669.95 B455m MAGNETISM AND METALLURGY	669.95 B669s SPECTROSCOPY IN THE METALLURGICAL INDUSTRY	Next

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P K Kelkar Library

Indian Institute of Technology, Kalyanpur, Kanpur, U P 208016 India| Web: https://pkklib.iitk.ac.in

Email : librarian@iitk.ac.in | Phone : +91 512 259-7233

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